Particulates can emanate from process equipment (e.g., in cvd and etch reactors)as well as from humans (from street clothes, skin flakes, etc. ) 尘粒也能由工艺设备(如化学气相淀积和刻蚀反应器)以及工作人员(身穿的外套,体表的皮屑等)而产生。
In contrast to the cvd process, mbe does not require the extensive safety precautions, although solid arsenic dopant must be handled carefully . 和化学气相淀积工艺相反,虽然在操作中对于固体砷还是必须非常小心掌握,但是,分子束外延不需要庞大的安定保险装置。
Packaging material volatile corrosion inhibiting film 包装材料气相防锈塑料薄膜
Determination on benzols of water by gas chromatography 气相色谱法测定水中苯系物
Determining phenol in water with gas chromatography 气相色谱法测定水中酚类物质
Experimental observables on nuclear liquid gas phase transition 气相变的实验观察
Dc discharge for the all gas - phase iodine laser 全气相化学激光体系的直流放电研究
Chemical reagent - general rules for the gas chromatography 化学试剂气相色谱法通则
A simple and rapid method for genome dna extraction from arabidopsis 以气相色谱法
Determination of sulphur dioxide by gas chromatography 气相色层分离法测定二氧化硫