- lithography
- photetch
- photoetching technique
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光刻技术的英文
例句与用法
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- Interferometirc lithographic technology incorporates laser , interference optics , diffraction optics and optical lithography and it is a frontier research subject in microfabrication technology and microelectronic field sponserd by national natural science foundation of china . the research for this technology in theory , simulation and experiments has important scientific meanings and broad application prospect for promoting lithographic limit , developing nanometer electronic and photoelectron devices , novel large screen panel display and novel lithographic equipment of our country
干涉光刻技术集激光、干涉和衍射光学及光学光刻于一体，是国家自然科学基金资助的微细加工技术和微电子领域的前沿研究课题，对其进行理论、模拟和实验研究，对推进光学光刻极限，发展我国纳米微电子和光电子器件、新型大屏幕平板显示器和新型光刻机具有重要的科学意义和广阔的应用前景。 - The theoretical research , computer simulation and experimental results analysis show that maskless laser interferometric lithography and holographic lithography have the characteristics of large field of view , high resolution , distortionless , relatively simple system structure , low costs and convenient realization way . they have a broad application prospect
激光干涉光刻技术研究四川大学博士学位论文理论研究、计算模拟和实验结果分析表明，无掩模激光干涉光刻和全息光刻具有大视场、高分辨率、无畸变、系统相对简单、成本较低，实现方便等特点，具有广阔的应用前景。 - In this paper , series of work about the fabrication of large computer - generated diffractive optical elements on curved surfaces is carried out supported by the national natural science foundation ( 60078006 ) and state key laboratory of applied optics of the chinese academy of science . 1
本文在国家自然科学基金( 60078006 )和中科院创新基金( 2002lq4 ) ，以及中科院应用光学国家重点实验室的资助和支持下，开展了利用光刻技术在大口径凹球面玻璃基底上制作衍射光学元件的相关工作： 1 - Heidelberg instruments mikrotechnik gmbh offers you pertinent information by telephone for the ranges micro technology , laser lithography and lithography in addition to semiconductor technology . contact heidelberg instruments mikrotechnik gmbh
Heidelberg instruments mikrotechnik gmbh是一家诚信的、高效能的生产商和服务商，该公司提供新型的、专门的产品，例如显微镜检查技术、显微镜标本制作技术,激光平版印刷、激光光刻技术,平版印刷、蚀刻技术、光刻技术,半导体技术。 - With the development of micro - electronics and information processing , microelectronic devices with high density , high velocity and superfrequency have been get rid of the stale and brought forth the fresh , which vastly prompt the development of the micro fabrication technologies to the field of the hyperfine , and put forward the higher requirement for the resolution of the conventional photo 1 i tho graphy
随着微电子和信息技术的飞速发展，高密度、高速度、超高频微电子器件不断推陈出新，促使微细加工技术不断向着超精细领域发展，对传统光学光刻技术的分辨本领提出更高的要求。传统光学光刻中提高分辨率往往是以牺牲系统焦深为代价的。