Imaging interferometric lithography ( iil ) transfers different components of spatial frequencies through the same limited aperture at different time to enhance the resolution power of lithography with increasing less cost of system 摘要掩模投影成像干涉光刻技术以在很小或几乎不增加光刻系统成本的基础上来提高光刻分辨率为目的,充分利用系统的有限孔径,将掩模图形不同的空间频率分别进行传递,最终以高分辨率对掩模成像。
With the development of electronic industry , integrated circuit ( ic ) technology plays an important role in the modern industry . as the technology of optical lithography acting as the kernel of 1c fabrication technology , it is attracted by all the countries of the world 在电子信息产业发展过程中,集成电路技术对现代化工业的发展和人们的生活起了极其重要的作用,而光刻技术是集成电路生产技术的核心和关键,倍受世界各国的关注。
Several key techniques that only exist in polar coordinate have been used in ldw processing . an efficient experiential formulation that indicates the relation between linewidth and laser power corresponding to various radial positions under constant angular velocity is presented based on the definition of exposure 本文在极坐标激光直写光刻技术研究中,解决了极坐标特有的关键技术,制作了同心环分划板,定位精度和线宽达到了设计要求。
Study on technology of laser direct writing photolithography based on cartesian and polar coordinate by using four - axis ldw system in this dissertation . several doe ' s fabricated by ldw have been applied in practice . the works have laid a foundation for developing more advanced ldw technology 本文开展了直角坐标和极坐标激光直写光刻理论与工艺研究,激光直写制作的衍射光学元件已得到了实际应用,为进一步发展激光直写光刻技术奠定理论与实验基础。
In chapter five , the structure and principle of hadamard transform imaging spectrometer are deseribed . method of manufacturing marks , the key element of the spectrometer by applying computer technology lithography is given , practical masks are obtained by this method , errors of the mask that affected the measurement result are modulaton , finally discusses the limitation of hadamard transform imaging spectrometer ' s application 阿达码变换成像光谱仪的关键元件是编码模板,给出了应用计算机技术、光刻技术等先进技术制作编码模板的方法,并应用该方法制作了31x33码元二维移动方式下的空间编码模板, 31x33码元一维移动方式下的空间编码模板,以及63码元的光谱编码模板等。