On the 128 degrees rotated , y - cut and x - propagation substrate of linbo3 , the interdigital saw transducer of 400um in electrode pitch and 100um in electrode strip is designed and fabricated by the technique of photolithography 在128度旋转, y向切割, x向传播的linbo _ 3晶片上,设计、并用光刻技术制作了电极周期为400 m ,电极线宽为100 m的叉指型表面弹性波换能器。
The grating and reticle , which linewidth errors are less than 10 % nominal linewidth , are fabricated by ldw . for the first time metallic mesh film with area 200mm 200mm fabricated by using ldw photolithography and coating technology 本文完成了直角坐标激光直写光刻技术研究,开展了离焦激光直写光刻的工艺研究,制作了光栅和网格分划板,线宽误差控制在10 %以内。
The basic principle , theory , main types and realizing methods of maskless laser interferometric lithographic technology used for generation of high resolution , deep sub - micron and nanometer patterns in large field of view are deeply investigated 深入研究了无掩模激光干涉光刻技术用于高分辨、大视场、深亚微米和纳米图形生成的基本原理、理论、主要类型和实现方法。
Of all these spl methods , the principles of five special spl methods are illustrated , respectively . the common problems existing in spl are given and prospects of application of these spl techniques to manufacturing nanometer - scale devices are analyzed 这一切为论文选题为基于afm的无掩膜电子束纳米级光刻技术研究即afm半导体、金属表面的场致氧化加工研究奠定了坚实的基础。
With the furthermore development of ultra thin film technology , soft x - ray multilayer mirrors was applied in many fields , such as astronomy , microscope technology , euv lithogrphy , x - ray laser , icf diagnosis and so on 随着软x射线超薄膜制备技术的不断发展,软x射线多层膜反射镜已在多个领域中投入研究与应用,如天文学、生物医学显微镜、极紫外投影光刻技术、 x射线激光、高温等离子体诊断等等。